The Institute of Scientific and Industrial Research, Osaka University


LAST UPDATE 2017/02/26

  • 研究者氏名
    Researcher Name

    今村健太郎 Kentaro IMAMURA
    助教 Assistant Professor
  • 所属
    Professional Affiliation

    The Institute of Scientific and Industrial Research, Osaka University

    Department of Semiconductor Materials and Processes
  • 研究キーワード
    Research Keywords

    Crystalline Si solar cells
    Si nanocrystals
    Micro-fabrication of Si
    Optical analysis
Research Subject
Fabrication of nano-structured Si surfaces with ultra-low reflectivity and its application to Si solar cells

研究の背景 Background


Silicon is widely used in semiconductor products, and thus it is indispensable for modern society. Especially, crystalline Si solar cells have more than 85 % of the market share of commercial solar cells, and therefore, it is very important for solving global environmental problems to produce high conversion efficiency Si solar cells with low cost process.

研究の目標 Outcome


Nanosized Si has various attractive characteristics which are different from those of bulk Si. One of the useful characteristics is ultra-low reflectivity which can be achieved by forming nanocrystalline Si layer on Si surfaces, i.e., the reflectivity of the Si surfaces decreases from 40% to less than 3%. Nanocrystalline Si layer is formed by use of our new chemical method. We are aiming to elucidate their physical properties, and to apply them to Si solar cells and to hydrogen generation materials.

研究図Research Figure

Fig.1. Nanocrystalline Si layer/Si structure formed by contact of Pt catalyst with Si immersed in an HF/H2O2 solution. Fig.2. Reflectivity of nanocrystalline Si (NC-Si) layer/Si structure. Fig.3. High-aspect-ratio Si micro-hole fabricated by contact of a fine Pt needle with Si immersed in an HF/H2O2 solution.

文献 / Publications

Appl. Phys. Lett., 103 (2013) 013110-1-4, J. Electrochem. Soc., 160 (2013) H443-H445, J. Appl. Phys., 112 (2012) 124322