Institute of Multidisciplinary Research for Advanced Materials, Tohoku University


LAST UPDATE 2021/05/08

  • 研究者氏名
    Researcher Name

    中川勝 Masaru NAKAGAWA
    教授 Professor
  • 所属
    Professional Affiliation

    Institute of Multidisciplinary Research for Advanced Materials, Tohoku University

    マテリアル・計測ハイブリッド研究センター 光機能材料化学分野
    Materials-Measurement Hybrid Research Center, Photo-Functional Material Chemistry
  • 研究キーワード
    Research Keywords

    Material chemistry・Interface science
    Photo-functional polymer resist materials
Research Subject
Ultimate nano-scale figuration and material science for creation of meta-sites

研究の背景 Background


Semiconductor technology has been called the rice of industry and will be responsible for information communication and data usage in the near future society. For the evolution of semiconductors, it is essential to explore extreme nanofabrication and material science which support the ultimate manufacturing technology for further miniaturization, multilayering, and high performance based on co-creation in the interdisciplinary fields of chemistry, physics, mechanical engineering, and applied optics. It is also important to propose solutions to energy problems based on ultimate manufacturing technology. Our goal is to create chemical energy-generating devices through innovations in nanofabrication methods of advanced lithography of electron beams and nanoimprinting.

研究の目標 Outcome


We propose nano/micro fabrication methods for organic, inorganic, and hybrid materials by precisely designing and controlling the interfacial functions of polymers, metals, and inorganic materials at the molecular level. We have proposed and are leading research on "metasites," which are artificially created sites with single-digit nanoscale precision for the purpose of inducing unexplored chemical reactions and physical phenomena in nanostructures of metals and dielectrics and in the controlled nanospaces between the structures.

研究図Research Figure

Fig.1. Our proposing ‘micro-print and nano-imprint’ method comprised of innovative laser-drilled screen printing and alignment processes for nanolithography.

Fig.2. (top-left) laser drilled polyimide through-hole mask, (top-right) silicon wafer with screen-printed UV-curable droplets, (middle-left) a region of (middle-right) printed UV-curable droplets, (bottom-left) imprint resist on silicon, (bottom-right) dry-etched silicon through imprint resist masks

文献 / Publications

(Review) Jpn. J. Appl. Phys. 2022, 61, SD0805; Microelectron. Eng. 2015, 133, 134; J. Photopolym. Sci. Technol. 2012, 25, 189. (Article) J. Vac. Sci. Technol. B 2022, 40, 062602; Sci. Rep. 2021, 11, 16550; Bull. Chem. Soc. Jpn. 2020, 93, 862; Chem. Lett. 2019, 48, 943; Langmuir 2018, 34, 9366.